Organosilicon function of gas barrier films purely deposited by inductively coupled plasma chemical vapor deposition system
- 1 November 2012
- journal article
- Published by Elsevier BV in Journal of Alloys and Compounds
- Vol. 542, 11-16
- https://doi.org/10.1016/j.jallcom.2012.07.053
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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