Octadecyltrichlorosilane adsorption kinetics on Si(100)/SiO2 surface: contact angle, AFM, FTIR and XPS analysis
- 1 March 2006
- journal article
- Published by Wiley in Surface and Interface Analysis
- Vol. 38 (3), 158-165
- https://doi.org/10.1002/sia.2309
Abstract
No abstract availableKeywords
This publication has 30 references indexed in Scilit:
- Growth Kinetics and Morphology of Self-Assembled Monolayers Formed by Contact Printing 7-Octenyltrichlorosilane and Octadecyltrichlorosilane on Si(100) WafersLangmuir, 2004
- Atomic force microscopy of thin organic films on silicon in ultrahigh vacuum and under ambient conditionsSurface and Interface Analysis, 2002
- Formation and Patterning of Self-Assembled Monolayers Derived from Long-Chain Organosilicon Amphiphiles and Their Use as Templates in Materials MicrofabricationLangmuir, 2000
- Observation of Three Growth Mechanisms in Self-Assembled MonolayersThe Journal of Physical Chemistry B, 1998
- Hybrid Mesoporous Materials with Functionalized MonolayersAdvanced Materials, 1998
- Structure and Stability of Patterned Self-Assembled Films of Octadecyltrichlorosilane Formed by Contact PrintingLangmuir, 1997
- Formation and Structure of Self-Assembled MonolayersChemical Reviews, 1996
- X-ray grazing incidence diffraction from alkylsiloxane monolayers on silicon wafersThe Journal of Chemical Physics, 1991
- Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substratesLangmuir, 1989
- Molecular monolayers and films. A panel report for the Materials Sciences Division of the Department of EnergyLangmuir, 1987