Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography
- 21 November 2005
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Technology Letters
- Vol. 17 (12), 2613-2615
- https://doi.org/10.1109/lpt.2005.859132
Abstract
We present a silicon-on-insulator (SOI) waveguide to fiber coupler fabricated using 248-nm-deep ultraviolet lithography. The loss of the taper structure is around 1 dB while the coupling loss from a lensed fiber into a 590-nm-wide SOI waveguide was measured to be 1.9 dB.Keywords
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