Interface dipole at metal-organic interfaces: Contribution of metal induced interface states
- 16 March 2009
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 94 (11), 113304
- https://doi.org/10.1063/1.3099836
Abstract
Despite the importance of interface dipole on the charge carrier injection at metal/organic contacts, there is yet no estimation of the various contributions to the overall dipole. We propose a simple approach to delineate and estimate the contribution of metal-induced interface states (MISs) toward the overall dipole. The relative contribution of the MIS was found to increase as the slope parameter decreases. By using published results, we estimate the relative MIS contributions in organic-silver contacts for various organic semiconductors to be −30%–80% of the overall dipole.This publication has 22 references indexed in Scilit:
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