Control of Wafer Temperature Uniformity in Rapid Thermal Processing Using an Optimal Iterative Learning Control Technique
- 13 March 2001
- journal article
- research article
- Published by American Chemical Society (ACS) in Industrial & Engineering Chemistry Research
- Vol. 40 (7), 1661-1672
- https://doi.org/10.1021/ie0005553
Abstract
No abstract availableKeywords
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