Inductive plasmas for plasma processing
- 1 May 1996
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 5 (2), 166-172
- https://doi.org/10.1088/0963-0252/5/2/008
Abstract
With the need for high plasma density and low pressure in single wafer etching tools, a number of inductive etching systems have been and are being developed for commercial sale. This paper reviews some of the history of low-pressure inductive plasmas, gives features of inductive plasmas, limitations, corrections and presents uses for plasma processing. The theory for the skin depth, rf coil impedance and efficiency is also discussed.Keywords
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