Plasma-assisted chemical vapor deposition process for depositing smooth diamond coatings on titanium alloys at moderate temperature
- 1 November 2000
- journal article
- Published by Elsevier BV in Diamond and Related Materials
- Vol. 9 (11), 1862-1866
- https://doi.org/10.1016/s0925-9635(00)00335-6
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Tribological performance of diamond-coated Ti–6Al–4V alloy with respect to diamond characteristicsSurface and Coatings Technology, 2000
- Tribological optimization of CVD diamond coated Ti-6Al-4VDiamond and Related Materials, 1998
- Control of diamond film microstructure by Ar additions to CH4/H2 microwave plasmasJournal of Applied Physics, 1998
- Two-step process for improved diamond deposition on titanium alloys at moderate temperatureApplied Physics Letters, 1998
- Characterization of diamond films deposited on titanium and its alloysThin Solid Films, 1995
- Carbon dimer, C2, as a growth species for diamond films from methane/hydrogen/argon microwave plasmasJournal of Vacuum Science & Technology A, 1995
- Diamond, diamond-like and titanium nitride biocompatible coatings for human body partsMaterials Science and Engineering B, 1994
- Diamond Coating of Titanium AlloysScience, 1994
- Interface characterization of chemically vapor deposited diamond on titanium and Ti-6Al-4VJournal of Applied Physics, 1993
- Friction and wear properties of diamonds and diamond coatingsSurface and Coatings Technology, 1991