Low pressure chemical vapor deposition growth of silicon quantum dots on insulator for nanoelectronics devices
- 4 August 2000
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 164 (1-4), 29-34
- https://doi.org/10.1016/s0169-4332(00)00332-9
Abstract
No abstract availableKeywords
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