Zinc oxide thin-film random lasers on silicon substrate

Abstract

Room-temperature ultraviolet lasing is demonstrated in mirrorless zinc oxide thin-film waveguides on (100) silicon substrate. Laser cavities, due to closed-loop optical scattering from the lateral facets of the irregular zinc oxide grains, are generated through the post-growth annealing of high-crystal-quality zinc oxide thin films obtained from the filtered cathodic vacuum arc technique. It is found that the lasing wavelength and linewidth of the zinc oxide random lasers under 355 nm optical excitation are around 390 nm and less than 0.4 nm, respectively. In addition, the lasing threshold characteristics are in good agreement with the random laser theory.