Effect of angle of deposition on micro-roughness parameters and optical properties of HfO2 thin films deposited by reactive electron beam evaporation
- 1 June 2016
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 609, 42-48
- https://doi.org/10.1016/j.tsf.2016.04.034
Abstract
No abstract availableKeywords
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