High‐throughput characterization of pattern formation in symmetric diblock copolymer films
- 24 July 2001
- journal article
- research article
- Published by Wiley in Journal of Polymer Science Part B: Polymer Physics
- Vol. 39 (18), 2141-2158
- https://doi.org/10.1002/polb.1188
Abstract
No abstract availableKeywords
This publication has 60 references indexed in Scilit:
- Combinatorial Materials Science for Polymer Thin-Film DewettingMacromolecules, 2000
- Phase Coherence and Microphase Separation Transitions in Diblock Copolymer Thin FilmsMacromolecules, 1999
- Molecular Weight Dependence of Shear Viscosity of a Polymer Monolayer: Evidence for the Lack of Chain Entanglement in the Two-Dimensional PlaneMacromolecules, 1998
- The Free Surface of Thin Diblock Copolymer Films: Experimental and Theoretical Investigations on the Formation and Growth of Surface Relief StructuresMacromolecules, 1995
- Experimental study of the surface structure of diblock copolymer films using microscopy and x-ray scatteringThe Journal of Chemical Physics, 1993
- Ordering of thin diblock copolymer filmsPhysical Review Letters, 1992
- Equilibrium surface composition of diblock copolymersThe Journal of Chemical Physics, 1990
- Islands and holes on the free surface of thin diblock copolymer films. I. Characteristics of formation and growthJournal de Physique, 1990
- Interference microscopy on thin diblock copolymer filmsJournal de Physique, 1990
- The effect of surface constraints on the ordering of block copolymer domainsJournal of Materials Science, 1988