Electrochemical evaluation of pinhole defects in TiN films prepared by r.f. reactive sputtering
- 30 August 1997
- journal article
- Published by Elsevier BV in Materials Science and Engineering: A
- Vol. 234-236, 649-652
- https://doi.org/10.1016/s0921-5093(97)00233-5
Abstract
No abstract availableKeywords
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