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Characteristics of silicon removal by fine focused gallium ion beam
Home
Publications
Characteristics of silicon removal by fine focused gallium ion beam
Characteristics of silicon removal by fine focused gallium ion beam
HY
H. Yamaguchi
H. Yamaguchi
AS
A. Shimase
A. Shimase
SH
S. Haraichi
S. Haraichi
TM
T. Miyauchi
T. Miyauchi
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1 January 1985
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 3
(1)
,
71-74
https://doi.org/10.1116/1.583294
Abstract
No abstract available
Keywords
ION BEAM
Cited by 68 articles