In situgrowth rate measurements during plasma-enhanced chemical vapour deposition of vertically aligned multiwall carbon nanotube films
- 29 June 2007
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 18 (30)
- https://doi.org/10.1088/0957-4484/18/30/305702
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- In situ measurements and modeling of carbon nanotube array growth kinetics during chemical vapor depositionApplied Physics A, 2005
- High growth rates and wall decoration of carbon nanotubes grown by plasma-enhanced chemical vapour depositionChemical Physics Letters, 2004
- In situ growth rate measurements and length control during chemical vapor deposition of vertically aligned multiwall carbon nanotubesApplied Physics Letters, 2003
- Dynamic Growth Rate Behavior of a Carbon Nanotube Forest Characterized by in Situ Optical Growth MonitoringNano Letters, 2003
- Diffusion-controlled kinetics of carbon nanotube forest growth by chemical vapor depositionThe Journal of Chemical Physics, 2003
- Carbon nanotube growth by PECVD: a reviewPlasma Sources Science and Technology, 2003
- In situoptical characterization of the alignment and density of carbon nanotubesNanotechnology, 2002
- Large-area synthesis of carbon nanofibres at room temperatureNature Materials, 2002
- Growth mechanism of carbon nanotube forests by chemical vapor depositionApplied Physics Letters, 2002
- In situ laser reflectance interferometry measurement of diamond film growthJournal of Applied Physics, 1996