Study of the resist deformation in nanoimprint lithography
- 1 November 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 19 (6), 2811-2815
- https://doi.org/10.1116/1.1415510
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Mold Surface Treatment for Imprint Lithography.Journal of Photopolymer Science and Technology, 2001
- Fine pattern imprint lithography using dimpled mold.Journal of Photopolymer Science and Technology, 2000
- Step and flash imprint lithography: a new approach to high-resolution patterningPublished by SPIE-Intl Soc Optical Eng ,1999
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995
- High strain-rate shear response of polycarbonate and polymethyl methacrylateProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1990
- Longitudinal volume viscosity of poly(methyl methacrylate)Journal of Polymer Science Part A: Polymer Chemistry, 1988
- Large elastic deformations of isotropic materials VI. Further results in the theory of torsion, shear and flexurePhilosophical Transactions of the Royal Society of London. Series A, Mathematical and Physical Sciences, 1949
- A Theory of Large Elastic DeformationJournal of Applied Physics, 1940