Growth of Lanthanum Silicate Thin Films by Liquid Injection MOCVD Using Tris[bis(trimethylsilyl)amido]lanthanum
- 3 January 2003
- journal article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 9 (1), 7-10
- https://doi.org/10.1002/cvde.200290009
Abstract
No abstract availableKeywords
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