STM writing of artificial nanostructures in ultrathin PMMA and SAM resists and subsequent pattern transfer in a Mo/Si multilayer by reactive ion etching
- 1 March 1998
- journal article
- research article
- Published by Springer Science and Business Media LLC in Applied Physics A
- Vol. 66 (7), S685-S688
- https://doi.org/10.1007/s003390051222