Chemical ordering and texture in Ni–25 at% Al thin films
- 8 February 2002
- journal article
- Published by Elsevier BV in Acta Materialia
- Vol. 50 (3), 643-651
- https://doi.org/10.1016/s1359-6454(01)00373-1
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Texture development of evaporated nickel films on molybdenum substratesThin Solid Films, 1997
- The early stages of solid-state reactions in Ni/Al multilayer filmsJournal of Applied Physics, 1996
- High-resolution electron microscopy of nanocrystalline Ni-Al alloys: instability of ordered structure and dynamic behaviour of grain boundariesJournal of Materials Science, 1994
- Chemically disordered Ni3Al synthesized by high vacuum evaporationJournal of Materials Research, 1991
- Phase formation in ion-irradiated and annealed Ni-rich Ni-Al thin filmsJournal of Applied Physics, 1991
- A thermodynamic and kinetic basis for understanding metastable phase formation during ion-beam mixing of nickel-aluminum alloysJournal of Materials Research, 1988
- Application of the embedded atom method to Ni3AlJournal of Materials Research, 1987
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Metastable alloy phases by co-sputteringActa Metallurgica, 1976
- The orientation of vapour depositsPhilosophical Magazine, 1962