Formation of carbon nanowires by annealing silicon carbide films deposited by magnetron sputtering
- 7 April 2002
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 193 (1-4), 87-91
- https://doi.org/10.1016/s0169-4332(02)00214-3
Abstract
No abstract availableKeywords
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