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Physical Models of Boron Diffusion in Ultrathin Gate Oxides
Home
Publications
Physical Models of Boron Diffusion in Ultrathin Gate Oxides
Physical Models of Boron Diffusion in Ultrathin Gate Oxides
RF
Richard B. Fair
Richard B. Fair
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1 February 1997
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 144
(2)
,
708-717
https://doi.org/10.1149/1.1837473
Abstract
No abstract available
Cited by 77 articles