Plasma immersion ion implantation—a fledgling technique for semiconductor processing
- 30 November 1996
- journal article
- Published by Elsevier BV in Materials Science and Engineering: R: Reports
- Vol. 17 (6-7), 207-280
- https://doi.org/10.1016/s0927-796x(96)00194-5
Abstract
No abstract availableKeywords
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