Application of high-κ gate dielectrics and metal gate electrodes to enable silicon and non-silicon logic nanotechnology
- 1 June 2005
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 80, 1-6
- https://doi.org/10.1016/j.mee.2005.04.035
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Benchmarking Nanotechnology for High-Performance and Low-Power Logic Transistor ApplicationsIEEE Transactions on Nanotechnology, 2005
- Self-Aligned Ballistic Molecular Transistors and Electrically Parallel Nanotube ArraysNano Letters, 2004
- High-$kappa$/Metal–Gate Stack and Its MOSFET CharacteristicsIEEE Electron Device Letters, 2004
- Gate dielectric scaling for high-performance CMOS: from SiO2 to high-KPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003