Increase in Electrical Resistivity of Copper and Aluminum Fine Lines
- 1 January 2002
- journal article
- Published by Japan Institute of Metals in MATERIALS TRANSACTIONS
- Vol. 43 (7), 1621-1623
- https://doi.org/10.2320/matertrans.43.1621
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Mean free paths of electrons in disordered metal filmsProceedings of the Physical Society, 1967
- The Influence of a Transverse Magnetic Field on the Conductivity of Thin Metallic FilmsPhysical Review B, 1950