GaAs metal–oxide–semiconductor field-effect transistor with nanometer-thin dielectric grown by atomic layer deposition
- 7 July 2003
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 83 (1), 180-182
- https://doi.org/10.1063/1.1590743
Abstract
A GaAs metal–oxide–semiconductor field-effect transistor(MOSFET) with thin Al 2 O 3 gate dielectric in nanometer (nm) range grown by atomic layer deposition is demonstrated. The nm-thin oxide layer with significant gate leakage current suppression is one of the key factors in downsizing field-effect transistors. A 1 μm gate-length depletion-mode n -channel GaAsMOSFET with an Al 2 O 3 gate oxide thickness of 8 nm, an equivalent SiO 2 thickness of ∼3 nm, shows a broad maximum transconductance of 120 mS/mm and a drain current of more than 400 mA/mm. The device shows a good linearity, low gate leakage current, and negligible hysteresis in drain current in a wide range of bias voltage.Keywords
This publication has 19 references indexed in Scilit:
- Improvement of the interface quality during thermal oxidation of Al0.98Ga0.02As layers due to the presence of low-temperature-grown GaAsApplied Physics Letters, 2000
- Improvement of wet-oxidized AlxGa1−xAs (x∼1) through the use of AlAs/GaAs digital alloysApplied Physics Letters, 2000
- Passivation of GaAs using (Ga2O3)1−x(Gd2O3)x, 0⩽x⩽1.0 filmsApplied Physics Letters, 1999
- Improved electrical characteristics of CoSi2 using HF-vapor pretreatmentIEEE Electron Device Letters, 1999
- Epitaxial Cubic Gadolinium Oxide as a Dielectric for Gallium Arsenide PassivationScience, 1999
- Demonstration of enhancement-mode p- and n-channel GaAs MOSFETS with Ga2O3(Gd2O3) As gate oxideSolid-State Electronics, 1997
- Low D/sub it/, thermodynamically stable Ga/sub 2/O/sub 3/-GaAs interfaces: fabrication, characterization, and modelingIEEE Transactions on Electron Devices, 1997
- Low interface state density oxide-GaAs structures fabricated by in situ molecular beam epitaxyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- AlxGa1−xAs–GaAs metal–oxide semiconductor field effect transistors formed by lateral water vapor oxidation of AlAsApplied Physics Letters, 1995
- GaAs MOS structures with Al2O3 grown by molecular beam reactionSurface Science, 1979