Diffusion without Vacancies or Interstitials: A New Concerted Exchange Mechanism
- 3 November 1986
- journal article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 57 (18), 2287-2290
- https://doi.org/10.1103/physrevlett.57.2287
Abstract
We present a novel concerted exchange mechanism for the diffusion of substitutional atoms in semiconductors that does not involve any defects. For self-diffusion in Si we show that this mechanism is energetically favorable and is able to account for a number of experimental observations. Implication for the diffusion of substitutional dopants is discussed.Keywords
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