Influence of H on low temperature Si(111) homoepitaxy
- 20 August 1995
- journal article
- Published by Elsevier BV in Surface Science
- Vol. 337 (1-2), L777-L782
- https://doi.org/10.1016/0039-6028(95)80036-0
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
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