Fabrication of silicon nanopillars using self-organized gold–chromium mask
- 14 January 2000
- journal article
- Published by Elsevier BV in Materials Science and Engineering B
- Vol. 69-70, 459-463
- https://doi.org/10.1016/s0921-5107(99)00244-5
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Fabrication of silicon cones and pillars using rough metal films as plasma etching masksApplied Physics Letters, 1999
- Silicon Nanopillars Formed by Reactive Ion Etching Using a Self-Organized Gold MaskPhysica Scripta, 1999
- Spontaneous ordering of bimodal ensembles of nanoscopic gold clustersNature, 1998
- Photoexcitation of Si-Si surface states in nanocrystallitesPhysical Review B, 1997
- Luminescence from amorphous silicon nanostructuresPhysical Review B, 1996
- Electroluminescent device based on silicon nanopillarsApplied Physics Letters, 1996
- Highly anisotropic room-temperature sub-half-micron Si reactive ion etching using fluorine only containing gasesMicroelectronic Engineering, 1995
- Natural masking for producing sub-10-nm silicon nanowiresMicroelectronic Engineering, 1995