Plasma-assisted self-sharpening of platelet-structured single-crystalline carbon nanocones
- 10 September 2007
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 91 (11), 113115
- https://doi.org/10.1063/1.2784932
Abstract
A mechanism and model for the vertical growth of platelet-structured vertically aligned single-crystalline carbon nanostructures by the formation of graphene layers on a flat top surface are proposed and verified experimentally. It is demonstrated that plasma-related effects lead to self-sharpening of tapered nanocones to form needlelike nanostructures, in a good agreement with the predicted dependence of the radius of a nanocone’s flat top on the incoming ion flux and surface temperature. The growth mechanism is relevant to a broad class of nanostructures including nanotips, nanoneedles, and nanowires and can be used to improve the predictability of nanofabrication processes.This publication has 26 references indexed in Scilit:
- Behaviour of oxygen atoms near the surface of nanostructured Nb2O5Journal of Physics D: Applied Physics, 2007
- Low temperature (<100°C) patterned growth of ZnO nanorod arrays on SiApplied Physics Letters, 2007
- High-Performance Transparent Conducting Oxide NanowiresNano Letters, 2006
- Correlation between plasma dynamics and porosity of Ge films synthesized by pulsed laser depositionApplied Physics Letters, 2006
- Near-infrared photoluminescence from vertical InN nanorod arrays grown on silicon: Effects of surface electron accumulation layerApplied Physics Letters, 2006
- Current-driven ignition of single-wall carbon nanotubesCarbon, 2006
- Electronic temperature and density of the plasma produced by nanosecond ultraviolet laser ablation of LiFApplied Physics Letters, 2005
- Electron field emission from GaN nanorod films grown on Si substrates with native silicon oxidesApplied Physics Letters, 2005
- Magnetic field effect on the sheath thickness in plasma immersion ion implantationApplied Physics Letters, 2002
- Plasma drift and nonuniformity effects in plasma immersion ion implantationApplied Physics Letters, 2000