Selective inductively coupled plasma etching of group-III nitrides in Cl2- and BCl3-based plasmas
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (3), 1621-1626
- https://doi.org/10.1116/1.581130
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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