Ion beam imprinting system for nanofabrication
- 30 September 2006
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 83 (4-9), 796-799
- https://doi.org/10.1016/j.mee.2006.01.094
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Combined electron- and ion-beam imprinter and its applicationsApplied Physics Letters, 2004
- Resolution improvement for a maskless microion beam reduction lithography systemJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003
- Formation of a few nanometer wide holes in membranes with a dual beam focused ion beam systemJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003
- Ion-beam sculpting at nanometre length scalesNature, 2001
- Rf driven multicusp ion source for pulsed or steady-state ion beam productionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993