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Oxynitride Deposition Kinetics in a SiH4 ‐ CO 2 ‐ NH 3 ‐ H 2 System
Home
Publications
Oxynitride Deposition Kinetics in a SiH4 ‐ CO 2 ‐ NH 3 ‐ H 2 System
Oxynitride Deposition Kinetics in a SiH4 ‐ CO 2 ‐ NH 3 ‐ H 2 System
AG
A. K. Gaind
A. K. Gaind
GA
G. K. Ackermann
G. K. Ackermann
VL
V. J. Lucarini
V. J. Lucarini
RB
R. L. Bratter
R. L. Bratter
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1 April 1977
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 124
(4)
,
599-606
https://doi.org/10.1149/1.2133357
Abstract
No abstract available
Cited by 18 articles