The growth of diamond in microwave plasma under low pressure
- 1 May 1987
- journal article
- research article
- Published by Springer Science and Business Media LLC in Journal of Materials Science
- Vol. 22 (5), 1557-1562
- https://doi.org/10.1007/bf01132374
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Growth of diamond at room temperature by an ion-beam sputter deposition under hydrogen-ion bombardmentJournal of Applied Physics, 1985
- Chemical vapour deposition of diamond in RF glow dischargeJournal of Materials Science Letters, 1985
- Diamond synthesis from gas phase in microwave plasmaJournal of Crystal Growth, 1983
- Hard diamondlike carbon films deposited by ionized deposition of methane gasJournal of Vacuum Science & Technology A, 1983
- Vapor Deposition of Diamond Particles from MethaneJapanese Journal of Applied Physics, 1982
- Vapor growth of diamond on diamond and other surfacesJournal of Crystal Growth, 1981
- The growth of carbon films with random atomic structure from ion impact damage in a hydrocarbon plasmaThin Solid Films, 1979
- Film preparation using plasma or ion activationThin Solid Films, 1979
- Ion-Beam Deposition of Thin Films of Diamondlike CarbonJournal of Applied Physics, 1971
- Adsorption of Gases Activated by Electron ImpactThe Journal of Chemical Physics, 1964