Microwave plasma etching
- 30 November 1984
- journal article
- Published by Elsevier BV in Vacuum
- Vol. 34 (10-11), 953-957
- https://doi.org/10.1016/0042-207x(84)90177-5
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Titration Method for Measuring Fluorine Atom Concentration in Microwave Plasma EtchingJapanese Journal of Applied Physics, 1983
- Microwave Plasma Etching of Si with CF 4 and SF 6 GasJournal of the Electrochemical Society, 1982
- Parameter Dependence of RIE Induced Radiation Damage in Silicon DioxideJournal of the Electrochemical Society, 1981
- The Roles of Ions and Neutral Active Species in Microwave Plasma EtchingJournal of the Electrochemical Society, 1979
- Plasma etching—A discussion of mechanismsJournal of Vacuum Science and Technology, 1979
- Microwave Plasma EtchingJapanese Journal of Applied Physics, 1977