High figure-of-merit ultrathin metal transparent electrodes incorporating a conductive grid

Abstract
It is known that ultrathin (950 Ω/◻) is reduced to ∼6.5 Ω/◻ when a 100 nm thick Cu grid is deposited on it. The transparency is instead maintained at values exceeding 75%. These results, which can be further improved by making thicker grids, already demonstrate the potential in applications, such as photovoltaic cells, optical detectors and displays.