Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas
- 28 February 2006
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 83 (2), 328-335
- https://doi.org/10.1016/j.mee.2005.09.007
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Science and Technology (R-11-2000-086-0000-0)
- Korea Science and Engineering Foundation
- Ministry of Education
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