Nanoporous Ultralow Dielectric Constant Organosilicates Templated by Triblock Copolymers
- 1 January 2002
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 14 (1), 369-374
- https://doi.org/10.1021/cm010690l
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Molecular Templating of Nanoporous Ultralow Dielectric Constant (≈1.5) Organosilicates by Tailoring the Microphase Separation of Triblock CopolymersChemistry of Materials, 2001
- Low Dielectric Constant Mesoporous Silica Films Through Molecularly Templated SynthesisAdvanced Materials, 2000
- Ordered Bicontinuous Nanoporous and Nanorelief Ceramic Films from Self Assembling Polymer PrecursorsScience, 1999
- In Search of Low- k DielectricsScience, 1999
- Catalytic Membrane Sensors. A Thin Film Modified H2Resistive Sensor for Multi-Molecular DetectionComments on Inorganic Chemistry, 1999
- Triblock Copolymer Syntheses of Mesoporous Silica with Periodic 50 to 300 Angstrom PoresScience, 1998
- Room temperature growth of mesoporous silica fibers: A new high‐surface‐area optical waveguideAdvanced Materials, 1997
- Some perspectives on the interpretation of proton NMR spin diffusion data in terms of polymer morphologiesSolid State Nuclear Magnetic Resonance, 1996
- An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experimentsJournal of Materials Research, 1992
- Solid state NMR investigation of cationic polymerized epoxy resinsJournal of Applied Polymer Science, 1992