Directed self-assembly of block copolymers for next generation nanolithography
Top Cited Papers
Open Access
- 8 December 2013
- journal article
- review article
- Published by Elsevier BV in Materials Today
- Vol. 16 (12), 468-476
- https://doi.org/10.1016/j.mattod.2013.11.002
Abstract
No abstract availableKeywords
This publication has 68 references indexed in Scilit:
- Directed self-assembly of block copolymers for universal nanopatterningSoft Matter, 2013
- Mussel‐Inspired Block Copolymer Lithography for Low Surface Energy Materials of Teflon, Graphene, and GoldAdvanced Materials, 2011
- Functional nanomaterials based on block copolymer self-assemblyProgress in Polymer Science, 2010
- Evolution of Block Copolymer Lithography to Highly Ordered Square ArraysScience, 2008
- Hierarchically Organized Carbon Nanotube Arrays from Self‐Assembled Block Copolymer NanotemplatesAdvanced Materials, 2008
- Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and PolymersAdvanced Materials, 2008
- Polymer self assembly in semiconductor microelectronicsIBM Journal of Research and Development, 2007
- Block Copolymers—Designer Soft MaterialsPhysics Today, 1999
- Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square CentimeterScience, 1997
- Block Copolymer Thermodynamics: Theory and ExperimentAnnual Review of Physical Chemistry, 1990