Pulsed laser deposition of silicon nitride thin films by laser ablation of a Si target in low pressure ammonia
- 1 June 1996
- journal article
- research article
- Published by Springer Science and Business Media LLC in Journal of Materials Science
- Vol. 31 (11), 2839-2847
- https://doi.org/10.1007/bf00355991
Abstract
No abstract availableKeywords
This publication has 32 references indexed in Scilit:
- Spectroscopic Ellipsometry Investigation of Amorphous Silicon Nitride Thin FilmsJournal of the Electrochemical Society, 1994
- Low pressure photodeposition of silicon nitride films using a xenon excimer lampApplied Physics Letters, 1993
- Direct nitridation of a silicon surface by multipulse excimer laser irradiation in a nitrogen-containing ambient gasJournal of Applied Physics, 1991
- Low-power-laser driven ultrafine silicon nitride production in a flowing systemInfrared Physics, 1990
- Modelling of silicon nitride deposition by 254 nm Hg-photosensitization and 185 nm photolysis of SiH4/NH3 gas mixtureApplied Surface Science, 1989
- Low temperature photon-controlled growth of thin films and multilayered structuresApplied Surface Science, 1989
- Laser Processing of Thin Films and MicrostructuresPublished by Springer Science and Business Media LLC ,1987
- Photo-Chemical Vapor Deposition of Silicon Nitride Film by Direct PhotolysisJapanese Journal of Applied Physics, 1983
- Laser-Induced Chemical ProcessesPublished by Springer Science and Business Media LLC ,1981
- Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen. I. Dielektrizitätskonstanten und Leitfähigkeiten der Mischkörper aus isotropen SubstanzenAnnalen der Physik, 1935