Analysis of Statistical Fluctuations due to Line Edge Roughness in sub-0.1μm MOSFETs
- 1 January 2001
- book chapter
- Published by Springer Science and Business Media LLC
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Resolution limiting mechanism in electron beam lithographyElectronics Letters, 2000
- Sub - 35 nm metal gratings fabricated using PMMA with high contrast developersMicroelectronic Engineering, 1998