A spectroscopic study of active species in DC and HF flowing discharges in - and Ar - - mixtures
- 1 August 1996
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 5 (3), 567-572
- https://doi.org/10.1088/0963-0252/5/3/026
Abstract
Optical emission spectroscopy and laser-induced fluorescence (LIF) techniques are used to study the production of active species in DC and HF - and - - Ar flowing discharges and post-discharges, in connection with plasma reactions for surface treatments. N and H ground state atom relative densities are obtained by two-photon LIF in a - flowing DC discharge and in the DC and HF post-discharge regions. The conditions to create maximum density of N and H species are determined in each case in relation to the plasma kinetics. In no case was the NH radical observed in the post-discharge regions, indicating that this radical does not contribute to the nitriding process.Keywords
This publication has 10 references indexed in Scilit:
- Absolute density measurements of ammonia synthetized in N2–H2 mixture dischargesApplied Physics Letters, 1996
- High fractional dissociation efficiency in H2 and H2-N2 gas mixtures in a helical resonator dischargeChemical Physics Letters, 1995
- Production of N, H, and NH active species in N2-H2 dc flowing dischargesPlasma Chemistry and Plasma Processing, 1995
- Angular momentum state mixing and quenching of n=3 atomic hydrogen fluorescenceChemical Physics, 1995
- Correlations between active species density and iron nitride layer growth in Ar-N2-H2microwave post-dischargesJournal of Physics D: Applied Physics, 1994
- Spectroscopy of flowing discharges and post-discharges in reactive gasesSurface and Coatings Technology, 1993
- Electron and vibrational kinetics in an N2-H2glow discharge with application to surface processesJournal of Physics D: Applied Physics, 1993
- Deactivation dynamics of vibrationally excited nitrogen molecules by nitrogen atoms. Effects on non-equilibrium vibrational distribution and dissociation rates of nitrogen under electrical dischargesChemical Physics Letters, 1992
- A laboratory study of the reactions of N+, N2+, N3+, N4+, O+, O2+, and NO+ ions with several molecules at 300 KThe Journal of Chemical Physics, 1978
- Temperature Dependences of the Rate Coefficients for the Reactions of Ar+ with O2, H2, and D2The Journal of Chemical Physics, 1970