A classification scheme for visual defects arising in semiconductor wafer inspection
- 2 June 1990
- journal article
- Published by Elsevier BV in Journal of Crystal Growth
- Vol. 103 (1), 398-406
- https://doi.org/10.1016/0022-0248(90)90217-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Analysis technology for VLSI fabricationProceedings of the IEEE, 1987
- Fractal approach to two-dimensional and three-dimensional surface roughnessWear, 1986
- Fractal-Based Description of Natural ScenesIeee Transactions On Pattern Analysis and Machine Intelligence, 1984
- Identifying and Locating Surface Defects in Wood: Part of an Automated Lumber Processing SystemIeee Transactions On Pattern Analysis and Machine Intelligence, 1983