Photoelectrochemical and Structural Properties of TiO2 and N-Doped TiO2 Thin Films Synthesized Using Pulsed Direct Current Plasma-Activated Chemical Vapor Deposition
- 17 November 2007
- journal article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry C
- Vol. 111 (49), 18334-18340
- https://doi.org/10.1021/jp075938u
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Efficiency of solar water splitting using semiconductor electrodesInternational Journal of Hydrogen Energy, 2006
- The role of nitrogen doping on the development of visible light-induced photocatalytic activity in thin TiO2 films grown on glass by chemical vapour depositionJournal of Photochemistry and Photobiology A: Chemistry, 2006
- Comment on “Photoelectron Spectroscopic Investigation of Nitrogen-Doped Titania Nanoparticles”The Journal of Physical Chemistry B, 2006
- Reply to “Comment on “Photoelectron Spectroscopic Investigation of Nitrogen-Doped Titania Nanoparticles'”The Journal of Physical Chemistry B, 2006
- Visible Light Activity and Photoelectrochemical Properties of Nitrogen-Doped TiO2The Journal of Physical Chemistry B, 2004
- Origin of the different photoactivity of-doped anatase and rutilePhysical Review B, 2004
- Visible-Light Photocatalysis in Nitrogen-Doped Titanium OxidesScience, 2001
- Comparison of hydrophilic properties of amorphous TiOx films obtained by radio frequency sputtering and plasma-enhanced chemical vapor depositionJournal of Materials Research, 2001
- Tin, Tic and Ti(C, N) film characterization and its relationship to tribological behaviourSurface and Interface Analysis, 1992
- Monotonic Behaviors in Semimetals in Strong Magnetic FieldsPhysical Review B, 1972