Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure
- 30 September 2006
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 83 (4-9), 893-896
- https://doi.org/10.1016/j.mee.2006.01.095
Abstract
No abstract availableKeywords
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- Drilled alternating-layer three-dimensional photonic crystals having a full photonic band gapApplied Physics Letters, 2000
- Imprint Lithography with 25-Nanometer ResolutionScience, 1996