High-quality Nb/HfOx-Hf/Nb Josephson junction
- 15 June 1992
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 60 (24), 3039-3041
- https://doi.org/10.1063/1.106776
Abstract
We fabricated a niobium (Nb) Josephson junction with a hafnium (Hf) overlayer. The Hf native oxide (HfOx), formed by thermal oxidation, was used as the new tunneling barrier. Hf was selected as an overlayer because of its good affinity to Nb and strong oxygen affinity. The junction was fabricated the same way as Nb/AlOx‐Al/Nb junctions. The junction showed excellent I‐V characteristics (Vm=40 mV and Vg=3.0 mV). The critical current of the junction did not change with annealing up to 250 °C.Keywords
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