Development of a Pad Conditioning Method for Oxide Film CMP using a High Pressure Micro Jet (HPMJ)
- 1 January 2006
- journal article
- Published by Japan Society for Precision Engineering in Journal of the Japan Society for Precision Engineering, Contributed Papers
- Vol. 72 (7), 924-928
- https://doi.org/10.2493/jspe.72.924
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Development and Analysis of a High-Pressure Micro Jet Pad Conditioning System for Interlayer Dielectric Chemical Mechanical PlanarizationJapanese Journal of Applied Physics, 2005
- Fundamental Tribological and Removal Rate Studies of Inter-Layer Dielectric Chemical Mechanical PlanarizationJapanese Journal of Applied Physics, 2003