Periodic morphological modification developed on the surface of polyethersulfone by XeCl excimer laser photoablation
- 31 July 1989
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (5), 510-512
- https://doi.org/10.1063/1.101863
Abstract
Periodic and stable micropatterns appeared on the surface of amorphous polyethersulfone etched with an excimer laser at 308 nm in ambient air and a vacuum. The control of such radiative conditions as fluence and incident angle enables us to modify the spacing and pattern of the microstructures. A topographical investigation with scanning electron microscopy and an experiment with x-ray photoelectron spectroscopy to determine its composition is reported.Keywords
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