Formation of DO23-Al3Zr by Zr ion implantation using a metal vapour vacuum arc ion source
- 1 September 2000
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 33 (18), 2300-2303
- https://doi.org/10.1088/0022-3727/33/18/314
Abstract
The Al-enriched intermetallic compound DO23-Al3Zr was directly formed by Zr ion implantation into Al films at a current density of 64 µA cm-2 using a metal vapour vacuum arc (MEVVA) ion source at a dose of 4×1017 ions cm-2. With increasing ion dose the crystallinity of the DO23-Al3Zr phase was gradually improved, and at a dose of 5×1017 ions cm-2 the DO23-Al3Zr layer was about 100 nm thick. The formed DO23-Al3Zr phase played a significant role in enhancing the hardness as well as the elastic modulus of the Al films.This publication has 11 references indexed in Scilit:
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