Deposition rate and three-dimensional uniformity of RF plasma deposited SiOx films
- 31 July 2001
- journal article
- Published by Elsevier BV in Surface and Coatings Technology
- Vol. 142-144, 849-855
- https://doi.org/10.1016/s0257-8972(01)01100-8
Abstract
No abstract availableKeywords
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