Industrial applications of low-temperature plasma physics
- 1 June 1995
- journal article
- Published by AIP Publishing in Physics of Plasmas
- Vol. 2 (6), 2164-2175
- https://doi.org/10.1063/1.871477
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Overview of growth and behaviour of clusters and particles in plasmasPlasma Sources Science and Technology, 1994
- Optical characterization of particle trapsPlasma Sources Science and Technology, 1994
- Particles in C2F6-CHF3and CF4-CHF3etching plasmasPlasma Sources Science and Technology, 1994
- Study of gate oxide breakdown caused by charge buildup during dry etchingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Microscopic uniformity in plasma etchingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Review of inductively coupled plasmas for plasma processingPlasma Sources Science and Technology, 1992
- Thin-oxide damage from gate charging during plasma processingIEEE Electron Device Letters, 1992
- Particle trapping phenomena in radio frequency plasmasApplied Physics Letters, 1990
- Electron cyclotron resonance microwave discharges for etching and thin-film depositionJournal of Vacuum Science & Technology A, 1989
- Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etchingJournal of Applied Physics, 1979