Attempt to deposit carbon nitride films by electrodeposition from an organic liquid
- 15 January 1999
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 59 (3), 1693-1696
- https://doi.org/10.1103/physrevb.59.1693
Abstract
Carbon nitride films were synthesized by electrodeposition from an organic liquid on silicon substrates at temperatures lower than 80 °C. The N/C ratio in the films is about 0.25. The x-ray diffraction measurement indicates that the film contains some polycrystalline phases. The Fourier-transform infrared spectroscopy, x-ray photoelectron spectroscopy, and Raman spectroscopy analyses suggest the presence of both single and double carbon-nitrogen bonds. The deposition mechanisms are also discussed. Our paper shows that the electrodeposition technique may hold some promise for synthesizing the metastable compound in the liquid phase.
Keywords
This publication has 17 references indexed in Scilit:
- An attempt to prepare carbon nitride by thermal plasma chemical vapor deposition from graphite and nitrogenJournal of Materials Research, 1998
- Preparation of carbon nitride C2N by shock-wave compression of poly(aminomethineimine)Journal of Materials Chemistry, 1998
- Optical properties of CNx films prepared by filtered arc depositionMaterials Letters, 1997
- Structure and characteristics ofthin films prepared by rf plasma-enhanced chemical vapor depositionPhysical Review B, 1997
- Identification of a new tetragonal CN phaseJournal of Crystal Growth, 1997
- Shielded arc ion plating and structural characterization of amorphous carbon nitride thin filmsThin Solid Films, 1997
- Carbon nitride thin films deposited by the reactive ion beam sputtering techniqueThin Solid Films, 1996
- Carbon Nitride Deposited Using Energetic Species: A Two-Phase SystemPhysical Review Letters, 1994
- Observation of dihedral transverse patterning of Gaussian beams in nonlinear opticsPhysical Review A, 1994
- Prediction of New Low Compressibility SolidsScience, 1989